JPH045000B2 - - Google Patents

Info

Publication number
JPH045000B2
JPH045000B2 JP60055217A JP5521785A JPH045000B2 JP H045000 B2 JPH045000 B2 JP H045000B2 JP 60055217 A JP60055217 A JP 60055217A JP 5521785 A JP5521785 A JP 5521785A JP H045000 B2 JPH045000 B2 JP H045000B2
Authority
JP
Japan
Prior art keywords
substrate
recess
susceptor
vapor phase
phase growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60055217A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61215289A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5521785A priority Critical patent/JPS61215289A/ja
Publication of JPS61215289A publication Critical patent/JPS61215289A/ja
Publication of JPH045000B2 publication Critical patent/JPH045000B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP5521785A 1985-03-19 1985-03-19 気相成長装置 Granted JPS61215289A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5521785A JPS61215289A (ja) 1985-03-19 1985-03-19 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5521785A JPS61215289A (ja) 1985-03-19 1985-03-19 気相成長装置

Publications (2)

Publication Number Publication Date
JPS61215289A JPS61215289A (ja) 1986-09-25
JPH045000B2 true JPH045000B2 (en]) 1992-01-30

Family

ID=12992447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5521785A Granted JPS61215289A (ja) 1985-03-19 1985-03-19 気相成長装置

Country Status (1)

Country Link
JP (1) JPS61215289A (en])

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69126724T2 (de) * 1990-03-19 1998-01-15 Toshiba Kawasaki Kk Vorrichtung zur Dampfphasenabscheidung
JP4592849B2 (ja) * 1999-10-29 2010-12-08 アプライド マテリアルズ インコーポレイテッド 半導体製造装置
JP2003086890A (ja) * 2001-09-11 2003-03-20 Oki Electric Ind Co Ltd 半導体発光素子の製造方法
JP4019998B2 (ja) * 2003-04-14 2007-12-12 信越半導体株式会社 サセプタ及び気相成長装置
JP4599816B2 (ja) 2003-08-01 2010-12-15 信越半導体株式会社 シリコンエピタキシャルウェーハの製造方法
KR20070110910A (ko) * 2005-08-05 2007-11-20 동경 엘렉트론 주식회사 기판 처리 장치 및 기판 탑재대
KR101074458B1 (ko) * 2009-06-11 2011-10-18 세메스 주식회사 기판 가열 유닛 및 이를 포함하는 기판 처리 장치
JP2012084683A (ja) * 2010-10-12 2012-04-26 Bridgestone Corp 支持体及びウエハ成膜処理方法
EP2850221B1 (en) * 2012-05-18 2022-07-06 Veeco Instruments Inc. Rotating disk reactor with ferrofluid seal for chemical vapor deposition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5742174Y2 (en]) * 1978-07-28 1982-09-17
JPS57203545U (en]) * 1981-06-19 1982-12-24

Also Published As

Publication number Publication date
JPS61215289A (ja) 1986-09-25

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term